Skin Care 111SKIN | Repairing Mask – 30Ml

Complete Description

• Ideal For Sensitized Or Aggressive Skin As Well As For Redness
• Reduces Oxidative Stress, Irritation And Redness
• Strengthens And Restores The Skin’S Protective Barrier
• Hydrates The Skin Deeply
• The Cle Nac Y2 Ingredient Is Scientifically Proven To Promote Glutathione Production And Encourages Cell Renewal To Visibly Repair The Skin And Fight Signs Of Premature Aging

How To Use It

Use Day Or Night, Applying A Generous Amount To Skin Freshly Cleansed.
For Best Results, Leave The Mask On Overnight And Rinse It Off In The Morning.

Ingredients

Aqua / Water / Eau, Dipropylene Glycol, Butylene Glycol, Squalane, Cetyl Palmitate, Hydroxyethyl Acrylate/Sodium Acryloyldimethyl Taurate Copolymer, 1,2-Hexanediol, Trehalose, Aloe Barbadensis (Aloe Vera) Leaf Extract, Propanediol, Panthenol, Acetyl Zingerone, Alcohol, C18-36 Acid Triglyceride, Phenoxyethanol, Glycerin, Jojoba Esters, Hydroxyacetophenone, Hydrogenated Olive Oil Unsaponifiables, Ceramide Np, Carbomer, C12-18 Acid Triglyceride, Caprylyl Glycol, Squalene, Sorbitan Isostearate, Polysorbate 60, Sodium Ascorbyl Phosphate, Tocopheryl Acetate, Potassium Hydroxide, Hydrogenated Lecithin, Ethylhexylglycerin, Magn Esium Ascorbyl Phosphate, Ectoin, Allantoin, Mannitol, Glyceryl Stearate, Phytosteryl Macadamate, Tasmannia Lanceolata Fruit/Leaf Extract, Silk Amino Acids, Ammonium Glycyrrhizate, Butyrospermum Parkii (Shea / Karite) Butter, Phytosterols, Cholesterol, Ceramide Ns, Ceramide As, Ceramide Ap , Tocopherol, Piperonyl Glucose, Centella Asiatica Leaf Extract, Caffeine, Acetyl Cysteine, Zinc Gluconate, Dipotassium Glycyrrhizate, Phenethyl Alcohol, Benzyl Alcohol, Aesculus Hippocastanum (Horse Chestnut / Marron) Seed Extract, Sodium Benzoate, Potassium Sorbate, Maltodextrin, Pentapeptide 59, Ceramide Eop.